multi-function plasma coating machine

multi-function plasma coating machine is equipped with evaporation source of electric arc
multi-function plasma coating machine designed to use advanced plasma technology for achievement of superhard film,


Features:
it has filament heating and ionization accelerating unit.
by use of new target power source, the uniformity of coating and efficiency of ionic shooting can be realized.

Carried out coatings
:TiN, TiCN, CrN, TiALN, TiNbu, TiCrN, ZrN, and various kinds of diamonds film (DLC).

Applied industry
: The equipment is widely used in IPG clocks, IPS watches and clocks, guns IP, mobile phone shell, hardware, sanitary ware, cutters, anti-friction tools, dies and mould, etc.


Technical parameter:
Mode
Dimension
JTL-800
JTL-1100
JTL-1250
800*1000mm
1100*1000mm
1250*1300mm

Coating mode and main confirguration
Six multi-arc targets + one set of column targets + one set of plane rectangle magnetron sputtering targets

Eight multi-arc targets + a pair of twin (MF)magnetron sputtering targets
Twelve multi-arc targets + two sets of plane rectangle magnetron sputtering targets+ a pair of twin (MF)magnetron sputtering targets
Power source
Electric arc power, DC magnetron power, MF magnetron power, filament power, pulse power, linear ionized source.
Process gas control
Quality flowmeter + electromagnetism ceramic valve
Vacuum chamber structure
Vertical single(side) door, pump system postposition, double water-cooling
Vacuum system
Molecule pump +Roots pump +Mechanical pump(5.0*10
-5
Pa)
Diffusion pump +Roots pump +Mechanical pump(5.0*10
-4
Pa)
Workpiece baking temperature

Normal temperature to 350 centi-degree PID control, radiation heating.
Workpiece motion mode
Public rotation Frequency control: 0-20 rotation per minute
Measure mode
Number display composite vacuum gauge: from atmosphere to 1.0*10
-5
Pa
Control mode
Manual/Automatic/PC/PLC + HMI/PC four choice of control mode
Remark
We can design the dimension of the equipment according to customers special technique requirement.